Low Scattering Substrate

We can provide special optical polishing service for optics or wedge substrate that achieve surface roughness of <0.2nm (Ra). These low scattering substrates are in high demand for high power laser and X-ray applications.

 

Use a wedged substrate for a beamsplitter to prevent effects of back reflection.
CaF2 (calcium fluoride) and MgF2 (magnesium fluoride) are mainly used in UV and IR for its high transmittance.
Our highly technical processing yields low surface roughness (microscopic irregularities) and precision surface accuracy (flatness of whole surface).


 

Common Specifications

Material Synthetic fused silica, UV Grade CaF2, MgF2
Surface Roughness <0.2nm(Ra)
Clear Aperture 90% of the diameter

 

Schematic Outline Drawing

 

Optics
Part Number Diameter
φD
Thickness
t
Material Surface flatness Parallelism Surface Quality (Scratch-Dig)
OPSQSP-25.4C05-10-5 φ25.4mm 5mm Synthetic fused silica λ/10 <5″ 10 − 5
OPSQSP-30C03-10-5 φ30mm 3mm Synthetic fused silica λ/10 <5″ 10 − 5
OPSQSP-30C05-10-5 φ30mm 5mm Synthetic fused silica λ/10 <5″ 10 − 5
OPSQSP-50C05-10-5 φ50mm 5mm Synthetic fused silica λ/10 <5″ 10 − 5
OPCFSP-25.4C05-10-5 φ25.4mm 5mm CaF2 λ/10 <5″ 20 − 10
OPCFSP-30C05-10-5 φ30mm 5mm CaF2 λ/10 <5″ 20 − 10
OPMFSP-25.4C05-10-5 φ25.4mm 5mm MaF2 λ/10 <5″ 20 − 10
OPMFSP-30C05-10-5 φ30mm 5mm MaF2 λ/10 <5″ 20 − 10

 

Wedge
Part Number Diameter
φD
Thickness
t
Material Surface flatness Wedge Angle
W
Surface Quality (Scratch-Dig)
WSSQSP-30C05-10-1 φ30mm 5mm Synthetic fused silica λ/10 1°±5′ 10 − 5
WSSQSP-50C08-10-1 φ50mm 8mm Synthetic fused silica λ/10 1°±5′ 10 − 5
WSCFSP-30C05-10-1 φ30mm 5mm CaF2 λ/10 1°±5′ 20 − 10
WSMFSP-30C05-10-1 φ30mm 5mm MaF2 λ/10 1°±5′ 20 − 10
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